Invention Publication
- Patent Title: MASK STAGE AND MASK MANUFACTURING APPARATUS HAVING THE SAME
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Application No.: US18321376Application Date: 2023-05-22
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Publication No.: US20240076771A1Publication Date: 2024-03-07
- Inventor: KYONGHO HONG , MYUNGKYU KIM , SUNGHO PARK , CHANG-KON PARK , SUKBEOM YOU , DONGJAE LEE
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-si, Gyeonggi-do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si, Gyeonggi-do
- Priority: KR 20220111817 2022.09.05
- Main IPC: C23C14/04
- IPC: C23C14/04 ; C23C14/24

Abstract:
A mask stage includes a stage inclined with respect to a vertical direction perpendicular to a plane defined by a first direction and a second direction intersecting each other, a plurality of first support units disposed between the stage and a mask frame disposed above the stage, and a plurality of second support units disposed on the stage and being adjacent to a lower side of the mask frame. The lower side of the mask frame extends in a first direction, and the second support units are respectively disposed under end portions of the lower side of the mask frame, which are opposite to each other in the first direction.
Information query
IPC分类: