Invention Publication
- Patent Title: SEMICONDUCTOR DEVICE
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Application No.: US18195970Application Date: 2023-05-11
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Publication No.: US20240079331A1Publication Date: 2024-03-07
- Inventor: Azmat RAHEEL , Jae Hyoung LIM , Kwan Young CHUN
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR SUWON-SI
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR SUWON-SI
- Priority: KR 20220108091 2022.08.29
- Main IPC: H01L23/528
- IPC: H01L23/528 ; H01L27/092 ; H01L29/06 ; H01L29/417 ; H01L29/423 ; H01L29/775

Abstract:
A semiconductor device includes: first and second active patterns spaced apart from each other in a third direction; a gate electrode covering the first and second active patterns and extending in a second direction; a first source/drain region disposed on opposing sides of the gate electrode and connected to the first active pattern; a second source/drain region disposed on opposing sides of the gate electrode and connected to the second active pattern; a plurality of first upper metal lines extending in a first direction on the second active pattern and spaced apart from each other in the second direction; and a lower metal line extending in the first direction on the first active pattern, wherein the first direction, the second direction and the third direction intersect each other.
Information query
IPC分类: