- 专利标题: OPAQUE QUARTZ GLASS AND A METHOD FOR PRODUCING THE SAME
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申请号: US18262842申请日: 2021-01-30
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公开(公告)号: US20240083803A1公开(公告)日: 2024-03-14
- 发明人: Takashi TANIGUCHI , Chiemi ITO , Takaya SUZUKI , Yuka OBA
- 申请人: Tosoh Quartz Corporation
- 申请人地址: JP Yamagata-shi, Yamagata
- 专利权人: Tosoh Quartz Corporation
- 当前专利权人: Tosoh Quartz Corporation
- 当前专利权人地址: JP Yamagata-shi, Yamagata
- 国际申请: PCT/JP2021/003437 2021.01.30
- 进入国家日期: 2023-07-25
- 主分类号: C03B19/06
- IPC分类号: C03B19/06 ; C03C3/06 ; C03C4/02
摘要:
A quartz glass provides an opaque quartz glass having high light-shielding property, excellent mechanical strength and excellent cleaning resistance against hydrofluoric acid. By setting the maximum width of the amorphous bubbles existing in the opaque quartz glass to an average of 3 to 15 μm and the density to 2.15 g/cm3 or more, the mechanical strength after baking and the cleaning resistance by hydrofluoric acid are improved. The opaque quartz glass has a whiteness at a thickness of 10 mm of 75 to 90%, the reflectance of light with a wavelength of 0.24 to 2.6 μm at a thickness of 4 mm is 60 to 85%, and the bending strength after baking is 95 MPa. In addition, a foaming agent may be mixed in the opaque quartz glass. An opaque quartz glass having cleaning resistance against acid can be obtained.
公开/授权文献
- US11993538B2 Opaque quartz glass and a method for producing the same 公开/授权日:2024-05-28
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