Invention Publication
- Patent Title: FERROELECTRIC MEMORY CELL
-
Application No.: US18511461Application Date: 2023-11-16
-
Publication No.: US20240090232A1Publication Date: 2024-03-14
- Inventor: Chung-Liang CHENG , Huang-Lin CHAO
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Main IPC: H10B53/20
- IPC: H10B53/20 ; H01L23/522 ; H01L23/528 ; H01L29/423 ; H10B51/10 ; H10B51/20 ; H10B53/00 ; H10B53/10

Abstract:
A ferroelectric memory cell (FeRAM) is disclosed that includes an active device (e.g., a transistor) and a passive device (e.g., a ferroelectric capacitor) integrated in a substrate. The transistor and its gate contacts are formed on a front side of the substrate. A carrier wafer can be bonded to the active device to allow the active device to be inverted so that the passive device and associated contacts can be electrically coupled from a back side of the substrate.
Public/Granted literature
- US12250824B2 Ferroelectric memory cell Public/Granted day:2025-03-11
Information query