Invention Publication
- Patent Title: METROLOGY METHOD AND SYSTEM AND LITHOGRAPHIC SYSTEM
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Application No.: US18269983Application Date: 2021-12-20
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Publication No.: US20240094643A1Publication Date: 2024-03-21
- Inventor: Filippo ALPEGGIANI , Harm Jan Willem BELT , Sebatianus Adrianus GOORDEN , Irwan Dani SETIJA , Simon Reinald HUISMAN , Henricus Petrus Maria PELLEMANS
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP 152365.9 2021.01.19
- International Application: PCT/EP2021/086861 2021.12.20
- Date entered country: 2023-06-28
- Main IPC: G03F7/00
- IPC: G03F7/00

Abstract:
A method for measuring a parameter of interest from a target and associated apparatuses. The method includes obtaining measurement acquisition data relating to measurement of the target and finite-size effect correction data and/or a trained model operable to correct for at least finite-size effects in the measurement acquisition data. At least finite-size effects in the measurement acquisition data is corrected for using the finite-size effect correction data and/or the trained model to obtain corrected measurement data and/or obtain a parameter of interest; and where the correcting does not directly determine the parameter of interest, determining the parameter of interest from the corrected measurement data.
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