专利检索 ap:("ASML NETHERLANDS B.V.") AND inv:"Sebatianus Adrianus GOORDEN" 第 1 页

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发明公开
METROLOGY METHOD AND SYSTEM AND LITHOGRAPHIC SYSTEM 审中-公开

公开(公告)号：US20240094643A1

公开(公告)日：2024-03-21

申请号：US18269983

申请日：2021-12-20

申请人： ASML NETHERLANDS B.V.

发明人： Filippo ALPEGGIANI , Harm Jan Willem BELT , Sebatianus Adrianus GOORDEN , Irwan Dani SETIJA , Simon Reinald HUISMAN , Henricus Petrus Maria PELLEMANS

IPC分类号： G03F7/00

CPC分类号： G03F7/706845 , G03F7/70633 , G03F7/70641 , G03F7/706839

摘要： A method for measuring a parameter of interest from a target and associated apparatuses. The method includes obtaining measurement acquisition data relating to measurement of the target and finite-size effect correction data and/or a trained model operable to correct for at least finite-size effects in the measurement acquisition data. At least finite-size effects in the measurement acquisition data is corrected for using the finite-size effect correction data and/or the trained model to obtain corrected measurement data and/or obtain a parameter of interest; and where the correcting does not directly determine the parameter of interest, determining the parameter of interest from the corrected measurement data.