Invention Publication
- Patent Title: ABSORBER AND METHOD OF FORMING THE SAME
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Application No.: US18279024Application Date: 2021-03-04
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Publication No.: US20240142679A1Publication Date: 2024-05-02
- Inventor: Conglin Sun , Chong Pei Ho , Lennon Yao Ting Lee
- Applicant: Agency for Science, Technology and Research
- Applicant Address: SG Singapore
- Assignee: Agency for Science, Technology and Research
- Current Assignee: Agency for Science, Technology and Research
- Current Assignee Address: SG Singapore
- International Application: PCT/SG2021/050112 2021.03.04
- Date entered country: 2023-08-25
- Main IPC: G02B5/20
- IPC: G02B5/20

Abstract:
An absorber and a method of forming an absorber. The absorber may include a semiconductor absorption structure doped with dopants of a first conductivity type. The absorber may also include a semiconductor substrate doped with dopants of a second conductivity type different from the first conductivity type. The absorber may further include a dielectric layer between the semiconductor absorption structure and the semiconductor substrate. The absorber may additionally include a buried semiconductor structure included in a cavity of the dielectric layer, the buried semiconductor structure doped with dopants of the first conductivity type.
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