Invention Publication
- Patent Title: SYSTEM AND METHOD FOR DISCOVERING PHOTORESIST DISSOLVENT
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Application No.: US18382349Application Date: 2023-10-20
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Publication No.: US20240142882A1Publication Date: 2024-05-02
- Inventor: Thanh Cuong NGUYEN , Jiyoung PARK , Jungah Kim , Seungmin LEE , Inkook JANG
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Priority: KR 20220139625 2022.10.26
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/40

Abstract:
A method for discovering a new photoresist dissolvent includes obtaining input data defining a ligand material, estimating a reaction energy of a ligand exchange reaction in which a first ligand of a first complex including a first metal and the first ligand is exchanged with a second ligand, based on the input data, estimating a residual concentration of the first metal corresponding to the reaction energy based on a physical model, and verifying a photoresist dissolvent providing the second ligand based on the residual concentration.
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