Invention Publication
- Patent Title: VACUUM ASSISTED FILTRATION
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Application No.: US18411963Application Date: 2024-01-12
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Publication No.: US20240149193A1Publication Date: 2024-05-09
- Inventor: Corey Lemley
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- The original application number of the division: US16788619 2020.02.12
- Main IPC: B01D29/96
- IPC: B01D29/96 ; B01D29/88 ; B01D36/00

Abstract:
A method of supplying a processing solution includes shutting off a feed line supplying the processing solution to a chemical filter, installing a dry chemical filter in a filter housing of the chemical filter, closing an output line from the filter housing to a nozzle configured to dispense the processing solution (either before or after installing the dry chemical filter), applying a vacuum to the filter housing while the feed line remains shut, and opening the feed line while locking in the vacuum within the filter housing. Shutting off the feed line and closing the output line may be accomplished by closing respective valves. Before installing the dry filter, a valve to the vacuum may be closed. The method may be performed by a processor executing a program stored in a non-transitory computer-readable medium.
Information query
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