Invention Publication
- Patent Title: THIN FILM TRANSISTOR, METHOD FOR MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE
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Application No.: US18509468Application Date: 2023-11-15
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Publication No.: US20240162234A1Publication Date: 2024-05-16
- Inventor: Toshikazu KONDO , Hideyuki KISHIDA
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Priority: JP 09037912 2009.02.20
- The original application number of the division: US12699080 2010.02.03
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L21/02 ; H01L21/477 ; H01L29/24 ; H01L29/45 ; H01L29/49 ; H01L29/66 ; H01L29/786 ; H10K59/12 ; H10K59/121 ; H10K59/123

Abstract:
In a thin film transistor, an increase in off current or negative shift of the threshold voltage is prevented. In the thin film transistor, a buffer layer is provided between an oxide semiconductor layer and each of a source electrode layer and a drain electrode layer. The buffer layer includes a metal oxide layer which is an insulator or a semiconductor over a middle portion of the oxide semiconductor layer. The metal oxide layer functions as a protective layer for suppressing incorporation of impurities into the oxide semiconductor layer. Therefore, in the thin film transistor, an increase in off current or negative shift of the threshold voltage can be prevented.
Public/Granted literature
- US12136629B2 Thin film transistor, method for manufacturing the same, and semiconductor device Public/Granted day:2024-11-05
Information query
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