Invention Publication
- Patent Title: METHOD, APPARATUS, AND SYSTEM WITH RESIST IMAGE ESTIMATION
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Application No.: US18518551Application Date: 2023-11-23
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Publication No.: US20240168372A1Publication Date: 2024-05-23
- Inventor: Deokyoung KANG , Youngchul KWAK , Serim RYOU , Seong-Jin PARK , Seon Min RHEE , Jaewon YANG , Eunju KIM , Hyeok LEE
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Priority: KR 20220158629 2022.11.23 KR 20230134431 2023.10.10
- Main IPC: G03F1/72
- IPC: G03F1/72 ; G06T7/564
Abstract:
A method and apparatus for estimating a resist image (RI) are disclosed. The method includes obtaining an aerial image (AI) and a first RI from a mask image (MI), obtaining a second RI from the AI, and obtaining a third RI based on the first RI and the second RI.
Information query
