Invention Publication
- Patent Title: Charged Particle Beam System
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Application No.: US18283499Application Date: 2021-03-26
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Publication No.: US20240177964A1Publication Date: 2024-05-30
- Inventor: Heita KIMIZUKA , Natsuki TSUNO , Yasuhiro SHIRASAKI , Minami UCHIHO
- Applicant: Hitachi High-Tech Corporation
- Applicant Address: JP Minato-ku, Tokyo
- Assignee: Hitachi High-Tech Corporation
- Current Assignee: Hitachi High-Tech Corporation
- Current Assignee Address: JP Minato-ku, Tokyo
- International Application: PCT/JP2021/012996 2021.03.26
- Date entered country: 2023-09-22
- Main IPC: H01J37/22
- IPC: H01J37/22 ; H01J37/244 ; H01J37/28

Abstract:
An object of the present disclosure is to provide a charged particle beam system capable of obtaining information about a sample by using a feature amount on an observed image caused by light interference, light diffraction, light standing waves, and the like caused by irradiating a sample with light, and the like. In the charged particle beam system according to the present disclosure, a first feature amount resulting from the light interference, the light diffraction, or the light standing wave generated by irradiating the sample with light is extracted from the observed image of the sample, and a second feature amount of the sample is obtained by using the first feature amount (see FIG. 6).
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