Invention Publication
- Patent Title: A SYSTEM TO GENERATE A HIGH YIELD OF NEGATIVE IONS FOR ICP-MS
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Application No.: US18286897Application Date: 2022-04-11
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Publication No.: US20240203722A1Publication Date: 2024-06-20
- Inventor: Gholamreza JAVAHERY , Sina ALAVI , Javad MOSTAGHIMI , Kaveh KAHEN
- Applicant: Kimia Analytics Inc
- Applicant Address: CA Thomhill
- Assignee: Kimia Analytics Inc
- Current Assignee: Kimia Analytics Inc
- Current Assignee Address: CA Thomhill
- Priority: WO TCA2022050559 2022.04.11
- International Application: PCT/CA2022/050559 2022.04.11
- Date entered country: 2023-10-13
- Main IPC: H01J49/10
- IPC: H01J49/10 ; H01J49/04 ; H01J49/06

Abstract:
A new ICP-MS ion transfer method is disclosed capable of generating and transporting high yields of positive and negative ions, with the ability of quenching undesirable meta-stable ions and neutrals while using the existing ICP torch. A dopant is added in various pressure regions of the mass spectrometer interface, where reaction time is suitable for gas-phase ion/molecular reaction to occur. Introducing dopants or analyte in the provided RF confinement fields generates a high yield of negative ions in various pressure regions of mass spectrometer. A mechanism utilizing free electrons and meta-stable neutrals (Ar* for example) is used to form high yields of negatively charged elements which are originally atomized within the plasma and are stable in negative ionic form.
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