Invention Publication
- Patent Title: HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS
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Application No.: US18411690Application Date: 2024-01-12
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Publication No.: US20240255842A1Publication Date: 2024-08-01
- Inventor: Sangmi KIM , Sunghwan KIM
- Applicant: SAMSUNG SDI CO., LTD.
- Applicant Address: KR Yongin-si
- Assignee: SAMSUNG SDI CO., LTD.
- Current Assignee: SAMSUNG SDI CO., LTD.
- Current Assignee Address: KR Yongin-si
- Priority: KR 20230006893 2023.01.17
- Main IPC: G03F1/68
- IPC: G03F1/68
Abstract:
A hardmask composition, a hardmask layer including a cured product of the aforementioned hardmask composition, and a method of forming patterns that includes using the hardmask layer including a cured product of the aforementioned hardmask composition, the hardmask composition including a solvent and a compound represented by Chemical Formula 1:
Information query
