An exposure apparatus includes a conveying mechanism and an exposure mechanism. The conveying mechanism is configured to convey a substrate, a surface of the substrate being coated with photoresist. The exposure mechanism includes an exposure source and an exposure member. The exposure source is configured to provide light to the substrate. The exposure member includes an exposure section opposite the substrate, where the exposure section is located between the exposure source and the substrate and disposed in close proximity to the substrate, the exposure section has a light-transmitting portion that allows light to be incident on the substrate and a light-shielding portion that prevents light from being incident on the substrate, and the exposure section is configured to keep the light-transmitting portion and the light-shielding portion in synchronized movement with the substrate.