公开(公告)号：US20240282975A1

公开(公告)日：2024-08-22

申请号：US18638617

申请日：2024-04-17

Applicant: CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED

Inventor： Keqiang LI ,  Xiaosong LIU ,  Zhiyang WU ,  Yi LU

IPC: H01M4/66

CPC classification number: H01M4/667 ,  H01M4/661

Abstract: A device for preparing a current collector assembly includes: a first feeding apparatus configured to provide a transfer film, the transfer film having a base layer and a metal layer formed thereon; a second feeding apparatus configured to provide a bottom film, the bottom film having a first surface and a second surface opposite to the first surface; a coating apparatus configured to applying an adhesive on the first surface to obtain a base film; and a transfer apparatus configured to transfer the metal layer to the base film to obtain the current collector assembly.

公开(公告)号：US20230356964A1

公开(公告)日：2023-11-09

申请号：US18356510

申请日：2023-07-21

Applicant: CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED

Inventor： Yi LU ,  Tao FENG ,  Xinlu FEI ,  Bin XIE ,  Keqiang LI ,  Fenggang ZHAO

IPC: B65G53/00

CPC classification number: B65G53/00

Abstract: A disposal system for battery includes: a moving mechanism; an accommodating mechanism, including a first side and a second side that are opposite each other along a length direction of the accommodating mechanism; a plurality of immersion mechanisms, arranged in sequence along the length direction of the accommodating mechanism, the plurality of immersion mechanisms are movably connected to the accommodating mechanism, and the immersion mechanism accommodates an immersion liquid; and a transfer mechanism, arranged opposite the first side of the accommodating mechanism and configured to transfer waste of a battery to the immersion mechanisms. The accommodating mechanism is provided in plurality, and the plurality of accommodating mechanisms are arranged along a width direction of the accommodating mechanism. In adjacent two of the accommodating mechanisms, the second side of one of the accommodating mechanisms is opposite the first side of another one of the accommodating mechanisms.

公开(公告)号：US20240243245A1

公开(公告)日：2024-07-18

申请号：US18435895

申请日：2024-02-07

Applicant: CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED

Inventor： Shitong CHEN ,  Bin XIE ,  Yi LU ,  Xinlu FEI ,  Keqiang LI ,  Fenggang ZHAO

IPC: H01M4/04

CPC classification number: H01M4/0435

Abstract: An electrode plate forming apparatus includes an unwinding device, a lithium replenishment device, a plurality of winding devices and a protection device. The lithium replenishment device is configured to clad a lithium strip to a surface of a master electrode plate body and form a master electrode plate. A slitting device is configured to slit the master electrode plate into a plurality of electrode plates. The winding devices are configured to pull the electrode plates to travel, each of the winding devices winding one corresponding electrode plate. The slitting device is disposed in an accommodating cavity of the protection device. The protection device is configured to at least partially separate particles from an external environment in a case that the slitting device slits the master electrode plate and generates the particles.

公开(公告)号：US20230044748A1

公开(公告)日：2023-02-09

申请号：US17965158

申请日：2022-10-13

Applicant: CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED

Inventor： Yi LU ,  Xiaosong LIU ,  Keqiang LI

IPC: C25D21/06

Abstract: This application relates to a filtering mechanism and a device for producing a conductive material, where the filtering mechanism includes a filtering body, a cover, and a supporting member. The filtering body includes an accommodating cavity for accommodating an electroplating material and an opening provided on the filtering body; the cover is configured to cover the opening and connect to the filtering body to enclose the electroplating material in the filtering body; and the supporting member is provided on the cover to enhance connection strength between the cover and the filtering body.

公开(公告)号：US20230411670A1

公开(公告)日：2023-12-21

申请号：US18239127

申请日：2023-08-29

Applicant: CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED

Inventor： Bin XIE ,  Shitong CHEN ,  Yi LU ,  Yuanyuan SHEN ,  Keqiang LI ,  Fenggang ZHAO

IPC: H01M10/04

CPC classification number: H01M10/0409

Abstract: The present application provides a pole piece forming apparatus, which may include an incoming structure, a slitter, a plurality of winders and a wrinkle remover. The incoming structure may provide a master pole piece. The slitter may slit the master pole piece into a plurality of pole pieces. The winders may pull the transport of the pole pieces, respective winding devices may wind one corresponding pole piece, and the slitter may be disposed between the incoming structure and the winders. The wrinkle remover may be arranged between the slitter and the winders. The wrinkle remover may include a first roller and a second roller that may be provided opposite to each other, the first roller may include a first rolling part, and the first rolling part and the second roller may be used for rolling an edge of a slitting edge of the pole piece.

公开(公告)号：US20240272562A1

公开(公告)日：2024-08-15

申请号：US18644211

申请日：2024-04-24

Applicant: CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED

Inventor： Xiaosong LIU ,  Keqiang LI ,  Zhiyang WU ,  Yi LU

IPC: G03F7/00 ,  B08B3/02 ,  C25F3/14 ,  G03F7/16 ,  H01M4/70

CPC classification number: G03F7/70991 ,  B08B3/02 ,  C25F3/14 ,  G03F7/168 ,  G03F7/7075 ,  B08B2203/02 ,  H01M4/70

Abstract: A substrate treatment apparatus, comprising: a coating device configured to coat a substrate, which is conveyed at a first speed in a feeding direction, with a material; a drying device configured to receive the substrate, which is coated by means of the coating device, at the first speed and dry the material; an exposure device configured to receive the substrate, which is dried by means of the drying device, at the first speed and continuously convey a mask at the first speed in the feeding direction, the mask being used for regional shading during exposure of the material by means of the exposure device; and an etching device configured to receive the substrate, which is exposed by means of the exposure device, at the first speed and etch the material and a portion of the substrate in an unexposed region of the substrate.

公开(公告)号：US20240264541A1

公开(公告)日：2024-08-08

申请号：US18612799

申请日：2024-03-21

Applicant: CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED

Inventor： Xiaosong LIU ,  Keqiang LI ,  Zhiyang WU ,  Yi LU

IPC: G03F7/00 ,  G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/2002 ,  G03F7/2032 ,  G03F7/7005 ,  G03F7/7055 ,  G03F7/70733

Abstract: An exposure apparatus includes a conveying mechanism and an exposure mechanism. The conveying mechanism is configured to convey a substrate, a surface of the substrate being coated with photoresist. The exposure mechanism includes an exposure source and an exposure member. The exposure source is configured to provide light to the substrate. The exposure member includes an exposure section opposite the substrate, where the exposure section is located between the exposure source and the substrate and disposed in close proximity to the substrate, the exposure section has a light-transmitting portion that allows light to be incident on the substrate and a light-shielding portion that prevents light from being incident on the substrate, and the exposure section is configured to keep the light-transmitting portion and the light-shielding portion in synchronized movement with the substrate.