Invention Publication
- Patent Title: METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUCING PHOTOSENSITIVE COMPOSITION
-
Application No.: US18609116Application Date: 2024-03-19
-
Publication No.: US20240280915A1Publication Date: 2024-08-22
- Inventor: Kei YAMAMOTO , Naohiro TANGO , Michihiro SHIRAKAWA
- Applicant: FujiFilm Corporation
- Applicant Address: JP Tokyo
- Assignee: FujiFilm Corporation
- Current Assignee: FujiFilm Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP 21161797 2021.09.30
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/038 ; G03F7/039 ; G03F7/30

Abstract:
Provided are a method for testing a photosensitive composition and a method for producing a photosensitive composition that can easily test whether or not the photosensitive composition exhibits a predetermined LWR. The method for testing a photosensitive composition has a step 1 of using a reference photosensitive composition including an acid decomposable resin having a group that is decomposed by an action of an acid to generate a polar group and a photoacid generator, to form a resist film on a substrate 1, removing the resist film on the substrate 1 using a treatment liquid, and measuring a number of defects on the substrate 1 in which the resist film on the substrate 1 has been removed, to obtain reference data; a step 2 of using a photosensitive composition for measurement including components of the same types as types of components included in the reference photosensitive composition, to form a resist film on a substrate 2, removing the resist film on the substrate 2 using a treatment liquid, and measuring a number of defects on the substrate 2 in which the resist film on the substrate 2 has been removed, to obtain measurement data; and a step 3 of performing comparison between the reference data and the measurement data to determine whether or not an allowable range is satisfied, wherein the treatment liquid includes predetermined components.
Information query