Invention Publication
- Patent Title: HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS
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Application No.: US18408858Application Date: 2024-01-10
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Publication No.: US20240294795A1Publication Date: 2024-09-05
- Inventor: Huiseon CHOE , Sunghwan KIM
- Applicant: SAMSUNG SDI CO., LTD.
- Applicant Address: KR Yongin-si
- Assignee: SAMSUNG SDI CO., LTD.
- Current Assignee: SAMSUNG SDI CO., LTD.
- Current Assignee Address: KR Yongin-si
- Priority: KR 20230019582 2023.02.14
- Main IPC: C09D165/00
- IPC: C09D165/00 ; G03F7/11
Abstract:
A hardmask composition, a hardmask layer including a cured product of the hardmask composition, and a method of forming patterns using the hardmask layer including a cured product of the hardmask composition, the hardmask composition including a compound represented by Chemical Formula 1; and a solvent,
Information query
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