- 专利标题: CRACK STOP RING TRENCH TO PREVENT EPITAXY CRACK PROPAGATION
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申请号: US18760292申请日: 2024-07-01
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公开(公告)号: US20240355761A1公开(公告)日: 2024-10-24
- 发明人: Jiun-Yu Chen , Chun-Lin Tsai , Yun-Hsiang Wang , Chia-Hsun Wu , Jiun-Lei Yu , Po-Chih Chen
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsinchu
- 分案原申请号: US17391341 2021.08.02
- 主分类号: H01L23/00
- IPC分类号: H01L23/00 ; H01L23/58 ; H01L25/065 ; H01L29/06
摘要:
In some embodiments, the present disclosure relates to a semiconductor structure. The semiconductor substrate includes a semiconductor material over a base substrate. The semiconductor substrate has one or more sidewalls forming a crack stop trench that is laterally between a central region of the semiconductor substrate and a peripheral region of the semiconductor substrate that surrounds the central region. The peripheral region of the semiconductor substrate includes a plurality of cracks.
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