- 专利标题: SEMICONDUCTOR DEVICE STRUCTURE WITH MAGNETIC ELEMENT
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申请号: US18767205申请日: 2024-07-09
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公开(公告)号: US20240363676A1公开(公告)日: 2024-10-31
- 发明人: Chi-Cheng CHEN , Wei-Li HUANG , Chun-Yi WU , Kuang-Yi WU , Hon-Lin HUANG , Chih-Hung SU , Chin-Yu KU , Chen-Shien CHEN
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsinchu
- 分案原申请号: US16432625 2019.06.05
- 主分类号: H01F41/04
- IPC分类号: H01F41/04 ; H01L21/768 ; H01L23/00 ; H01L23/31 ; H01L23/532
摘要:
A semiconductor device structure is provided. The semiconductor device structure includes a substrate and a magnetic element over the substrate. The magnetic element has multiple sub-layers, and each sub-layer is wider than another sub-layer above it. The semiconductor device structure also includes an isolation layer extending exceeding edges the magnetic element, and the isolation layer contains a polymer material. The semiconductor device structure further includes a conductive line over the isolation layer and extending exceeding the edges of the magnetic element.
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