Invention Application
- Patent Title: MICROWAVE PLASMA APPLICATOR WITH REPLACEABLE DIELECTRIC PLATE
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Application No.: US18144745Application Date: 2023-05-08
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Publication No.: US20240379331A1Publication Date: 2024-11-14
- Inventor: Thai Cheng Chua , Kelvin Chan , Adam Fischbach , Farzad Houshmand , Christian Valencia , Philip Allan Kraus
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H05H1/46

Abstract:
Embodiments disclosed herein include an applicator for microwave plasma generation. In an embodiment, the applicator comprises a resonator body with a hole into an axial center of the resonator body, where the resonator body comprises a first dielectric material. In an embodiment, the applicator further comprises a pin inserted into the hole, where the pin is an electrically conductive material. In an embodiment, the applicator further comprises a plate under the resonator body, where the plate comprises a second dielectric material that is different than the first dielectric material.
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