Invention Application
- Patent Title: CLEANING FLUIDS FOR USE IN ADDITIVE MANUFACTURING APPARATUSES AND METHODS FOR MONITORING STATUS AND PERFORMANCE OF THE SAME
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Application No.: US18813323Application Date: 2024-08-23
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Publication No.: US20240408876A1Publication Date: 2024-12-12
- Inventor: William C. Alberts , Vadim Bromberg , Kwok Pong Chan , Robert Edgar Estes , Jacob Mayer , Joshua Tyler Mook , Janet Mekker , William Cosmo Murphy , Arunkumar Natarajan , Mary Kathryn Thompson , Xi Yang , Travis Sands
- Applicant: General Electric Company
- Applicant Address: US OH Evendale
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US OH Evendale
- Main IPC: B41J2/165
- IPC: B41J2/165 ; B22F10/14 ; B22F10/38 ; B22F10/70 ; B22F12/90 ; C09D9/00 ; C09D11/107 ; C09D11/30
Abstract:
Embodiments of the present disclosure are directed to additive manufacturing apparatuses, cleaning stations incorporated therein, and methods of cleaning using the cleaning stations.
Information query
IPC分类:
