Invention Application
- Patent Title: High-Speed Vertical Cavity Surface Emitting Laser, Optoelectronic Device with the Same, and Manufacturing Method Thereof
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Application No.: US18527172Application Date: 2023-12-01
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Publication No.: US20240429682A1Publication Date: 2024-12-26
- Inventor: Jiaxing Wang , Jianqiang Chen
- Applicant: Shenzhen Berxel Photonics Co., Ltd.
- Applicant Address: CN Shenzhen City
- Assignee: Shenzhen Berxel Photonics Co., Ltd.
- Current Assignee: Shenzhen Berxel Photonics Co., Ltd.
- Current Assignee Address: CN Shenzhen City
- Priority: CN202310727909.6 20230620,CN202321584140.9 20230620
- Main IPC: H01S5/183
- IPC: H01S5/183 ; H01S5/026

Abstract:
The present disclosure provides a high-speed vertical cavity surface emitting laser, an optoelectronic device with the same, and a manufacturing method thereof. The high-speed vertical cavity surface emitting laser includes a substrate layer, a first electrode layer, a first reflector layer, an active layer, an oxide-confined layer, a second reflector layer and a second electrode layer, wherein the first electrode layer is an N-type electrode layer and the second electrode layer is a P-type electrode layer. The oxidation aperture in the oxide-confined layer is drop-shaped.
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