Invention Application
- Patent Title: PHOTOCURABLE RESINS WITH HIGH HEAT DEFLECTION TEMPERATURES
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Application No.: US18716539Application Date: 2022-12-07
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Publication No.: US20250043056A1Publication Date: 2025-02-06
- Inventor: Lu ZHANG , John STEWART
- Applicant: BASF SE
- Applicant Address: DE Ludwigshafen am Rhein
- Assignee: BASF SE
- Current Assignee: BASF SE
- Current Assignee Address: DE Ludwigshafen am Rhein
- International Application: PCT/US2022/052149 WO 20221207
- Main IPC: C08F265/06
- IPC: C08F265/06 ; B29C64/129 ; B29K433/00 ; B33Y10/00 ; B33Y70/00

Abstract:
Described herein are photopolymerizable compositions for use in 3D printing. The compositions contain highly crosslinkable acrylate monomers, oligomers comprising a polyether acrylate oligomer, a polyester oligomer, an unsaturated polyester oligomer, or a combination thereof and a photoinitiator. The compositions, after photopolymerization, have a high heat deflection temperature, while maintaining strong mechanical properties. Also described are methods for fabricating three dimensional objects utilizing these compositions, and three dimensional objects made from these compositions.
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