Invention Application
- Patent Title: COMPOSITION FOR FORMING RESIST UNDERLAYER FILM HAVING SACCHARIN SKELETON
-
Application No.: US18718710Application Date: 2022-12-22
-
Publication No.: US20250053088A1Publication Date: 2025-02-13
- Inventor: Tomotada HIROHARA , Mamoru TAMURA
- Applicant: NISSAN CHEMICAL CORPORATION
- Applicant Address: JP Tokyo
- Assignee: NISSAN CHEMICAL CORPORATION
- Current Assignee: NISSAN CHEMICAL CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2021-210529 20211224
- International Application: PCT/JP2022/047257 WO 20221222
- Main IPC: G03F7/039
- IPC: G03F7/039 ; C08L63/04 ; G03F7/004 ; G03F7/20 ; G03F7/32
Abstract:
A composition for forming a resist underlayer film, containing a solvent and a polymer including a structure represented by formula (A) below. In formula (A), * represents a bond.
Information query
IPC分类:
