Invention Application
- Patent Title: METHOD OF MANUFACTURING DEHYDROGENATION CATALYST USING ATOMIC LAYER DEPOSITION
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Application No.: US18739029Application Date: 2024-06-10
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Publication No.: US20250101587A1Publication Date: 2025-03-27
- Inventor: Yong Min KIM , Suk Woo NAM , Hyuntae SOHN , Hyangsoo JEONG , Sung Pil YOON , Sun-Hee CHOI , Yu-Jin LEE
- Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
- Applicant Address: KR Seoul
- Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee Address: KR Seoul
- Priority: KR10-2023-0126878 20230922
- Main IPC: C23C16/455
- IPC: C23C16/455 ; B01J21/04 ; B01J21/06 ; B01J23/46 ; B01J37/02 ; B01J37/16 ; C23C16/40 ; C23C16/56
Abstract:
Disclosed herein is a method of manufacturing a dehydrogenation catalyst, the method includes: forming a functional oxide coating layer on a surface of a support with a first atomic layer deposition; and depositing metal particles on the surface of the support on which the functional oxide coating layer is formed, with a second atomic layer deposition.
Information query
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