发明授权
- 专利标题： Method of preparing photoconductive layers on substrates
- 专利标题（中）： 在基底上制备光子层的方法
-
申请号： US3607388D申请日： 1968-03-14
-
公开(公告)号： US3607388A公开(公告)日： 1971-09-21
- 发明人: HORI HIROO , TSUJI SHIGEO , KIUCHI YUJI
- 申请人： TOKYO SHIBAURA ELECTRIC CO
- 专利权人： Tokyo Shibaura Electric Co
- 当前专利权人： Tokyo Shibaura Electric Co
- 优先权： JP1670767 1967-03-18
- 主分类号： H01J29/45
- IPC分类号： H01J29/45 ; B44D1/02 ; G03G5/00
摘要：
A method of preparing a vapor-deposited layer having photoconductivity on a substrate, in which lead oxide and at least one of the compounds selected from the group consisting of chalcogenides of Cu, Ag, Zn, Cd, Hg, Ga, In, Tl, Ge, Sn, Sb and Bi are evaporated simultaneously from separate sources, and are vapor-deposited on the substrate. This vapor deposition is carried out in an oxygen or oxygen-containing atmosphere.