Invention Grant
- Patent Title: Method of manufacturing multi-function LSI wafers
- Patent Title (中): 制造多功能LSI晶圆的方法
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Application No.: US36709373Application Date: 1973-06-04
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Publication No.: US3879839APublication Date: 1975-04-29
- Inventor: LOGUE JOSEPH C
- Applicant: IBM
- Assignee: Ibm
- Current Assignee: Ibm
- Priority: US36709373 1973-06-04
- Main IPC: H01L21/822
- IPC: H01L21/822 ; H01L21/00 ; H01L21/66 ; H01L21/82 ; H01L27/00 ; H01L27/04 ; H01L27/118 ; H01L7/64
Abstract:
A system that is to be placed on a wafer is partitioned into reasonably large functions, each provided with a set of I/O and power pads. The wafer design is called ''''design A''''. A second wafer design (design B) that is the mirror image of design A is also constructed. Wafers of designs A and B are tested and divided into two groups: group I wafers have relatively few functions that are inoperative; group II wafers have relatively few functions that are operative. Inoperative functions are removed from group I wafers and discarded; good functions are removed from group II wafers and retained. A given function on wafer A is the mirror image of the same function on wafer B. Therefore, a given function from a group II wafer A (or B) can be inverted and attached to a group I wafer B (or A) that has had the corresponding function removed from it. The I/O and power pads of the function removed from the group II wafer are joined to the I/O and power pads remaining on the group I wafer.
Information query
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