发明授权
- 专利标题: Fluorine-containing compounds
- 专利标题(中): 含氟化合物
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申请号: US511272申请日: 1974-10-02
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公开(公告)号: US3952075A公开(公告)日: 1976-04-20
- 发明人: Yasusi Nakamura , Masashi Umemura , Michimasa Yonekura
- 申请人: Yasusi Nakamura , Masashi Umemura , Michimasa Yonekura
- 申请人地址: JA Tokyo
- 专利权人: Asahi Denka Kogyo K.K.
- 当前专利权人: Asahi Denka Kogyo K.K.
- 当前专利权人地址: JA Tokyo
- 优先权: JA48-111226 19731003; JA48-111227 19731003; JA48-111229 19731003; JA48-132040 19731124; JA48-132041 19731124; JA48-132043 19731124; JA48-132044 19731124; JA48-111225 19731003
- 主分类号: A62D1/02
- IPC分类号: A62D1/02 ; B01F17/00 ; C07C309/06 ; C07F9/09 ; C08G65/26 ; C08G65/326 ; C08G65/327 ; C11D1/00 ; D06M13/292 ; C07C43/17 ; C07C101/26 ; C07C141/00
摘要:
The fluorine-containing organic compound has the general formula:R.sub.f (CH.sub.2).sub.p O(RO).sub.m (CONHR'NHCOO).sub.q (C.sub.2 H.sub.4 O).sub.n X,wherein R.sub.f is a perfluoro alkyl group; R is an alkylene group; R' is a hydrocarbylene group; X is H, --PO.sub.3 H.sub.2 or --SO.sub.3 H; m and n are one of 0 and 1 to 50; p is one of 1 to 10; and q is 0 or 1,And is suited for a surface active agent having a high level of the surface activating property at a practical concentration.
公开/授权文献
- US5049925A Method and apparatus for focusing a wafer stepper 公开/授权日:1991-09-17
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