发明授权
US4001021A Lithographic development of a lith-type silver halide emulsions
containing a benzimidazole
失效
含BENZIMIDAZOLE的LITH型银膜乳液的光刻性研究
- 专利标题： Lithographic development of a lith-type silver halide emulsions containing a benzimidazole
- 专利标题（中）： 含BENZIMIDAZOLE的LITH型银膜乳液的光刻性研究
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申请号： US554924申请日： 1975-03-03
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公开(公告)号： US4001021A公开(公告)日： 1977-01-04
- 发明人: Tomio Nakajima , Teiji Habu , Elichi Sakamoto , Hiroshi Yamada , Katsuhide Mitsui , Eisaku Hayashi
- 申请人： Tomio Nakajima , Teiji Habu , Elichi Sakamoto , Hiroshi Yamada , Katsuhide Mitsui , Eisaku Hayashi
- 申请人地址： JA
- 专利权人： Konishiroku Photo Industry Co., Ltd.
- 当前专利权人： Konishiroku Photo Industry Co., Ltd.
- 当前专利权人地址： JA
- 优先权： JA47-64958 19720630; UK29619/73 19730621; DT2332754 19730627
- 主分类号： G03C1/06
- IPC分类号： G03C1/06 ; G03C5/20
摘要：
An improved lith-type silver halide photosensitive material of a wide latitude for infectious developing is disclosed which comprises, in an amount of 5 mg to 5 g per mole of silver halide, a compound represented by the following general formula: ##STR1## wherein R.sub.1 is a substituted or unsubstituted alkyl, aryl, aralkyl, arythio or aryloxy group, and R.sub.2 is hydrogen, halogen, alkyl, alkoxy or nitro.
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