发明授权
- 专利标题: Metallized film
- 专利标题(中): 金属化薄膜
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申请号: US654820申请日: 1976-02-03
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公开(公告)号: US4049859A公开(公告)日: 1977-09-20
- 发明人: Shinsuke Yoshikawa , Tohru Sasaki , Syuuzi Terasaki
- 申请人: Shinsuke Yoshikawa , Tohru Sasaki , Syuuzi Terasaki
- 申请人地址: JA Tokyo
- 专利权人: Kureha Kagaku Kogyo Kabushiki Kaisha
- 当前专利权人: Kureha Kagaku Kogyo Kabushiki Kaisha
- 当前专利权人地址: JA Tokyo
- 优先权: JA50-13320 19750203
- 主分类号: B32B15/08
- IPC分类号: B32B15/08 ; B05D7/02 ; B32B15/04 ; H01B3/30 ; H01B5/14 ; H01G4/008 ; H01L41/047 ; H01L41/08 ; H01L41/10
摘要:
Metallized plastic films having deposited metal layers on both surfaces and being adapted for use as dielectric films, piezoelectric films or pyroelectric films are disclosed. At least a portion of the metal layer deposited on one surface of the film has a relatively increased thickness of 700 A or more and at least a portion of the metal layer deposited on the other surface has a relatively reduced thickness of 600 A or less. The increased thickness and reduced thickness portions are positioned opposite to one another. The thin layer permits rapid self recovery of localized dielectric breakdown, while the relatively thick layer provides better utility for the electric uses to which the film is put.
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