发明授权
- 专利标题: Method for growing epitaxial layers on multiple semiconductor wafers from liquid phase
- 专利标题(中): 从液相在多个半导体晶片上生长外延层的方法
-
申请号: US667867申请日: 1976-03-17
-
公开(公告)号: US4063972A公开(公告)日: 1977-12-20
- 发明人: Shin-ichi Akai , Hideki Mori , Takashi Shimoda , Shin-ichi Iguchi
- 申请人: Shin-ichi Akai , Hideki Mori , Takashi Shimoda , Shin-ichi Iguchi
- 申请人地址: JA Osaka
- 专利权人: Sumitomo Electric Industries, Ltd.
- 当前专利权人: Sumitomo Electric Industries, Ltd.
- 当前专利权人地址: JA Osaka
- 优先权: JA50-37319 19750326
- 主分类号: C30B19/00
- IPC分类号: C30B19/00 ; C30B19/06 ; C30B19/10 ; H01L21/208
摘要:
A plurality of single-crystal epitaxial layers of semiconductors are simultaneously grown on a plurality of suitable substrates from the liquid phase by a method which includes the step of consecutively, and at times simultaneously, supplying small portions of liquid solution from a solution reservoir onto all the surfaces of the substrates in a plurality of wells which are provided on a surface of a rotatable circular lower plate so that epitaxial growth can be simultaneously carried out in all wells. The solution reservoir is positioned on a radius of the lower plate on which a circular upper plate is also provided in a non-rotatable state relative to the solution reservoir. Small portions of liquid solution are supplied by rotating the lower plate relative to the upper plate and the solution reservoir, and constrained in shape and volume which are adjusted by the upper plate and the wells. The composition and doping level of epitaxial layers are controlled through vapor-liquid communication.
公开/授权文献
信息查询