发明授权
- 专利标题： Apparatus and method for cleaning and drying semiconductors
- 专利标题（中）： 用于清洁和干燥半导体的装置和方法
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申请号： US726058申请日： 1976-09-23
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公开(公告)号： US4079522A公开(公告)日： 1978-03-21
- 发明人: William Edward Ham
- 申请人： William Edward Ham
- 申请人地址： NY New York
- 专利权人： RCA Corporation
- 当前专利权人： RCA Corporation
- 当前专利权人地址： NY New York
- 主分类号： C30B33/00
- IPC分类号： C30B33/00 ; H01L21/306 ; F26B3/34
摘要：
A semiconductor wafer is cleansed of loose foreign surface matter and chemical impurities near the surface in an apparatus which passes superheated steam over the wafer. Condensate is permitted to form and drip off the wafer. After rising above 100.degree. C the wafer becomes dry, and is removed from the apparatus and then permitted to cool.
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