发明授权
- 专利标题: Plating method for memory elements
- 专利标题(中): 记忆元素的电镀方法
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申请号: US786926申请日: 1977-04-12
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公开(公告)号: US4108739A公开(公告)日: 1978-08-22
- 发明人: Eiichi Tadokoro , Tatsuji Kitamoto
- 申请人: Eiichi Tadokoro , Tatsuji Kitamoto
- 申请人地址: JPX Minami Ashigara
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JPX Minami Ashigara
- 优先权: JPX48-99641 19730904
- 主分类号: C25D3/56
- IPC分类号: C25D3/56 ; C25D5/10 ; C25D5/14
摘要:
A method for electroplating in a single electroplating bath comprising varying the electric current density so that a non-magnetic plated film and a ferromagnetic plated film are selectively deposited. To achieve this effect the electroplating bath must contain at least about 1 g/l NaH.sub.2 PO.sub.2.H.sub.2 O.
公开/授权文献
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