发明授权
- 专利标题： Dot-etching solution
- 专利标题（中）： 点刻蚀溶液
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申请号： US817475申请日： 1977-07-20
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公开(公告)号： US4124516A公开(公告)日： 1978-11-07
- 发明人: Fumiaki Shinozaki , Tomoaki Ikeda , Yasuo Washizawa , Sho Nakao
- 申请人： Fumiaki Shinozaki , Tomoaki Ikeda , Yasuo Washizawa , Sho Nakao
- 申请人地址： JPX Minami-ashigara
- 专利权人： Fuji Photo Film Co., Ltd.
- 当前专利权人： Fuji Photo Film Co., Ltd.
- 当前专利权人地址： JPX Minami-ashigara
- 优先权： JPX51/124618 19761018
- 主分类号： G03C5/38
- IPC分类号： G03C5/38 ; B41C1/02 ; C23F1/20 ; G03F7/00 ; C09K13/04
摘要：
A dot-etching solution for dot-etching a halftone image of a metal composed mainly of aluminum, the dot-etching solution comprising(1) water,(2) (a) phosphorous acid or (b) phosphorous acid and phosphoric acid,(3) at least one of a bismuth compound and an antimony compound, and(4) at least one compound selected from hydrogen chloride, an alkali metal chloride, calcium chloride and magnesium chloride.
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