发明授权
- 专利标题: Metal-dielectric electron beam scanning stack
- 专利标题(中): 金属电介质电子束扫描堆叠
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申请号: US746910申请日: 1976-12-02
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公开(公告)号: US4160310A公开(公告)日: 1979-07-10
- 发明人: William G. Manns
- 申请人: William G. Manns
- 申请人地址: TX Dallas
- 专利权人: Texas Instruments Incorporated
- 当前专利权人: Texas Instruments Incorporated
- 当前专利权人地址: TX Dallas
- 主分类号: H01J9/14
- IPC分类号: H01J9/14 ; H01J31/12 ; H01J9/02
摘要:
A metal-dielectric electron beam scanning stack and method for making the same is disclosed. The electron beam scanning stack subassembly is fabricated from a series of metal plates, each having a plurality of apertures defined therein at least one plate comprising a spacer plate. Individual apertures are aligned with corresponding apertures of all other plates to form a plurality of electron beam channels. These plates are electrically isolated from and bonded together by spacer plates coated with dielectric material. By etching isolation channels in a selected pattern in these plates, control plates are fabricated having a plurality of isolated conductive portions arranged in selected patterns. Subassemblies are bonded together using either dielectric material or dielectrically coated metal spacer plates having a plurality of correspondingly aligned apertures. Contact leads from the plurality of isolated conductive portions are isolation etched into the inactive peripheral area of the plate. These leads extend along the periphery of the plate where they terminate in the form of multiple contact means protruding from the edge of the plate.
公开/授权文献
- US5986573A Method and apparatus for metering building structures 公开/授权日:1999-11-16
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