发明授权
- 专利标题： Sub 100A range line width pattern fabrication
- 专利标题（中）： 亚100A范围线宽图案制造
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申请号： US11360申请日： 1979-02-12
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公开(公告)号： US4197332A公开(公告)日： 1980-04-08
- 发明人: Alec N. Broers , Jerome J. Cuomo , Robert B. Laibowitz , Walter W. Molzen, Jr.
- 申请人： Alec N. Broers , Jerome J. Cuomo , Robert B. Laibowitz , Walter W. Molzen, Jr.
- 申请人地址： NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： NY Armonk
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; H01L21/027 ; H01L21/312 ; B05D3/06
摘要：
Sub-100A line width patterns are formed on a member by electron beam conversion and fixing of a resist that arrives at the reaction zone point by surface migration into a resist pattern of a precise thickness and width while the member rests on an electron backscattering control support. The resist is for example a contamination film from a vacuum pump oil used in evacuating the apparatus used to perform the process, e.g. silicone oil.
公开/授权文献
- US3067635A Recessed boring fixture 公开/授权日：1962-12-11
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