发明授权
- 专利标题: Ionization resistant MOS structure
- 专利标题(中): 电离电阻MOS结构
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申请号: US922225申请日: 1978-07-05
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公开(公告)号: US4247862A公开(公告)日: 1981-01-27
- 发明人: Raphael Klein
- 申请人: Raphael Klein
- 申请人地址: CA Santa Clara
- 专利权人: Intel Corporation
- 当前专利权人: Intel Corporation
- 当前专利权人地址: CA Santa Clara
- 主分类号: H01L21/265
- IPC分类号: H01L21/265 ; H01L23/556 ; H01L27/108 ; H01L27/04
摘要:
A structure and method for preventing minority carriers caused by an alpha particle, or the like, from drifting into storage regions and causing a false data bit. In a high density MOS circuit, a single alpha particle including one originating within the substrate or circuit package can generate enough carriers to give a false data bit. A minority carrier reflective barrier is employed to prevent substantial numbers of minority carriers from drifting into the active layer. In the presently preferred embodiment, this barrier is formed by ion implanting the upper surface of the substrate.
公开/授权文献
- US5931808A Cassette for endoscope 公开/授权日:1999-08-03
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