发明授权
- 专利标题: Photosensitive material for use in electrophotography
- 专利标题(中): 用于电子照相术的感光材料
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申请号: US50096申请日: 1979-06-19
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公开(公告)号: US4250240A公开(公告)日: 1981-02-10
- 发明人: Masaru Shimada , Shoji Maruyama , Hiroshi Tamura
- 申请人: Masaru Shimada , Shoji Maruyama , Hiroshi Tamura
- 申请人地址: JPX Tokyo
- 专利权人: Ricoh Company, Ltd.
- 当前专利权人: Ricoh Company, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX53-74280 19780621
- 主分类号: G03G5/02
- IPC分类号: G03G5/02 ; G03G5/147 ; G03G5/04
摘要:
The present invention relates to a photosensitive material for use in electrophotography comprising a photoconductive layer on which there is a transparent protective layer consisting essentially of a substance resulting from partial hydrolysis of a mixture of (a) a compound having the following general formula I, (b) a copolymer of a compound having the general formula II with a compound having the general formula III or maleic anhydride and (c) a compound having the general formula IV,(1) General formula I(R.sup.1).sub.l Si(OR.sup.2).sub.m [wherein R.sup.1 is a C.sub.1-4 alkyl radical, vinyl radical, .gamma.-methacryloxypropyl radical, phenyl radical, .gamma.-glycidoxypropyl radical, .gamma.-chloropropyl radical, .gamma.-mercaptopropyl radical, .gamma.-.beta.(aminoethyl).gamma.-aminopropyl radical or .gamma.-aminopropyl radical; R.sup.2 is a hydroxyethylalkyl ether radical or C.sub.1-4 alkyl radical; l is 0-2; and m is 2-4.](2) General formula II ##STR1## [wherein R.sup.3 is hydrogen or a methyl radical; R.sup.4 is hydrogen or a C.sub.1-4 alkyl radical; n is 1-4; and q is 1-3.](3) General formula III ##STR2## [wherein R.sup.5 is hydrogen or a methyl radical; R.sup.6 is --COOR.sup.7 (R.sup.7 is hydrogen or a C.sub.1-12 alkyl radical, hydroxyalkyl radical, glycidyl radical or dimethylaminoalkyl radical), --CN, --OCOCH.sub.3, --CONH.sub.2, ##STR3## (4) General formula IV ##STR4## [wherein R.sup.8 is a C.sub.1-4 alkyl radical or phenyl radical; z is 2-25.]
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