发明授权
- 专利标题: Device for use in photochemical and photomechanical processes
- 专利标题(中): 用于光化学和光机械过程的设备
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申请号: US042434申请日: 1979-05-25
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公开(公告)号: US4268608A公开(公告)日: 1981-05-19
- 发明人: Thaddeus M. Muzyczko , Thomas H. Jones
- 申请人: Thaddeus M. Muzyczko , Thomas H. Jones
- 申请人地址: IL Des Plaines
- 专利权人: The Richardson Company
- 当前专利权人: The Richardson Company
- 当前专利权人地址: IL Des Plaines
- 主分类号: C08F2/50
- IPC分类号: C08F2/50 ; G03F7/032 ; G03C1/68 ; G03C5/00
摘要:
A photoreactive composition containing an effective amount of a polymer which includes as a recurring structure: ##STR1## wherein Ar is a bivalent aromatic radical, and M is selected from the class consisting of hydrogen, alkali metal, ammonium, and substituted ammonium. These compositions are useful in a wide variety of photochemical and photomechanical processes and are particularly suited for use as photopolymers, photoinitiators and photosensitizers in light sensitive coatings of presensitized lithographic plates.
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