发明授权
US4336438A Apparatus for automatic semi-batch sheet treatment of semiconductor
wafers by plasma reaction
失效
用于通过等离子体反应自动半批片处理半导体晶片的装置
- 专利标题: Apparatus for automatic semi-batch sheet treatment of semiconductor wafers by plasma reaction
- 专利标题(中): 用于通过等离子体反应自动半批片处理半导体晶片的装置
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申请号: US187748申请日: 1980-09-16
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公开(公告)号: US4336438A公开(公告)日: 1982-06-22
- 发明人: Akira Uehara , Hiroyuki Kiyota , Shigekazu Miyazaki , Hisashi Nakane
- 申请人: Akira Uehara , Hiroyuki Kiyota , Shigekazu Miyazaki , Hisashi Nakane
- 申请人地址: JPX Kanagawa
- 专利权人: Tokyo Ohka Kogyo Kabushiki Kaisha
- 当前专利权人: Tokyo Ohka Kogyo Kabushiki Kaisha
- 当前专利权人地址: JPX Kanagawa
- 优先权: JPX54-124709[U] 19790911
- 主分类号: H01L21/302
- IPC分类号: H01L21/302 ; B65G49/07 ; H01L21/3065 ; H01L21/677 ; B23K9/00 ; B65H1/06
摘要:
An apparatus for automatic semi-batch sheet treatment of wafers such as high-purity silicon semiconductor wafers by plasma reaction is disclosed. The apparatus comprises a wafer carrying mechanism, a reaction chamber with an opening at the bottom, a wafer table disposed beneath the opening and provided with a sub-table for mounting the wafer, and control devices for driving the above elements in linkage motion. The wafer carrying mechanism is substantially composed of a conveyor for carrying a wafer to be treated, a pair of open-close type wafer carrying wire conveyors which are spaced in parallel at a certain distance and open and close in linkage motion so that the wafer table may pass vertically therethrough to be fixed vacuum-tightly to the reaction chamber, a mechanism for opening and closing the wire conveyors and a treated wafer carrying conveyor. The subtable is vertically movable and capable of passing the wire conveyors when closed.
公开/授权文献
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