发明授权
- 专利标题： Surface-treating agent adapted for intermediate products of a semiconductor device
- 专利标题（中）： 适用于半导体器件的中间产品的表面处理剂
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申请号： US213317申请日： 1980-12-05
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公开(公告)号： US4339340A公开(公告)日： 1982-07-13
- 发明人: Hisashi Muraoka , Masafumi Asano , Taizo Ohashi , Yuzo Shimazaki
- 申请人： Hisashi Muraoka , Masafumi Asano , Taizo Ohashi , Yuzo Shimazaki
- 申请人地址： JPX
- 专利权人： Tokyo Shibaura Electric Co., Ltd.
- 当前专利权人： Tokyo Shibaura Electric Co., Ltd.
- 当前专利权人地址： JPX
- 优先权： JPX50/140721 19751126; JPX50/140722 19751126; JPX50/140723 19751126; JPX50/140724 19751126; JPX50/140725 19751126; JPX50/140726 19751126
- 主分类号： C11D3/30
- IPC分类号： C11D3/30 ; C23G1/14 ; H01L21/306 ; B44C1/22 ; C03C15/00 ; C23F1/00
摘要：
A surface-treating agent formed of an aqueous solution containing 0.01 to 20% by weight of trialkyl(hydroxyalkyl) ammonium hydroxide. The treating agent is adapted to be used for the effective removal of organic and inorganic contaminants deposited on the surface of intermediate semiconductor products obtained in the respective steps of manufacturing a semiconductor device and the efficient etching of a metal layer used as wiring. Further, it can be used for the elimination of those portions of a positive working photoresist film coated on the surface of the intermediate semiconductor products which are and are not exposed to a light by controlling its concentration.
公开/授权文献
- USPP7209P Apple tree: Keystone 公开/授权日：1990-04-03
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