发明授权
- 专利标题: Method for fabricating DH lasers
- 专利标题(中): 制造DH激光器的方法
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申请号: US297195申请日: 1981-08-28
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公开(公告)号: US4372791A公开(公告)日: 1983-02-08
- 发明人: Jaw J. Hsieh
- 申请人: Jaw J. Hsieh
- 申请人地址: MA Cambridge
- 专利权人: Massachusetts Institute of Technology
- 当前专利权人: Massachusetts Institute of Technology
- 当前专利权人地址: MA Cambridge
- 主分类号: H01L33/00
- IPC分类号: H01L33/00 ; H01L33/30 ; H01S5/323 ; H01L21/208
摘要:
Double-heterostructure (DH) diode lasers based upon very thin epitaxial layers of Ga.sub.x In.sub.1-x As.sub.y P.sub.1-y grown on and lattice-matched to oriented InP substrates are disclosed. A preferred method for fabricating such lasers involves the successive growth, on an InP substrate, of an InP buffer layer, the GaInAsP active layer and an InP top barrier layer using liquid phase epitaxy techniques to grow these layers from supercooled solutions. Stripe geometry lasers can be fabricated from these materials which emit in the 1.1-1.3 .mu.m range and are capable of cw operation for extended periods at room temperature.
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