发明授权
US4372791A Method for fabricating DH lasers 失效
制造DH激光器的方法

Method for fabricating DH lasers
摘要:
Double-heterostructure (DH) diode lasers based upon very thin epitaxial layers of Ga.sub.x In.sub.1-x As.sub.y P.sub.1-y grown on and lattice-matched to oriented InP substrates are disclosed. A preferred method for fabricating such lasers involves the successive growth, on an InP substrate, of an InP buffer layer, the GaInAsP active layer and an InP top barrier layer using liquid phase epitaxy techniques to grow these layers from supercooled solutions. Stripe geometry lasers can be fabricated from these materials which emit in the 1.1-1.3 .mu.m range and are capable of cw operation for extended periods at room temperature.
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