Invention Grant
- Patent Title: Solar cell structure incorporating a novel single crystal silicon material
- Patent Title (中): 结合新型单晶硅材料的太阳能电池结构
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Application No.: US309695Application Date: 1981-10-08
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Publication No.: US4392011APublication Date: 1983-07-05
- Inventor: Jacques I. Pankove , Chung P. Wu
- Applicant: Jacques I. Pankove , Chung P. Wu
- Applicant Address: NY New York
- Assignee: RCA Corporation
- Current Assignee: RCA Corporation
- Current Assignee Address: NY New York
- Main IPC: C30B1/02
- IPC: C30B1/02 ; H01L21/20 ; H01L21/268 ; H01L31/068 ; H01L31/18 ; H01L31/06
Abstract:
A novel hydrogen rich single crystal silicon material having a band gap energy greater than 1.1 eV can be fabricated by forming an amorphous region of graded crystallinity in a body of single crystalline silicon and thereafter contacting the region with atomic hydrogen followed by pulsed laser annealing at a sufficient power and for a sufficient duration to recrystallize the region into single crystal silicon without out-gassing the hydrogen. The new material can be used to fabricate semiconductor devices such as single crystal silicon solar cells with surface window regions having a greater band gap energy than that of single crystal silicon without hydrogen.
Public/Granted literature
- US5559283A Casing structure for chromatograph Public/Granted day:1996-09-24
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