发明授权
- 专利标题： Glass for photoetching mask
- 专利标题（中）： 用于光刻面罩的玻璃
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申请号： US413316申请日： 1982-08-31
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公开(公告)号： US4403043A公开(公告)日： 1983-09-06
- 发明人: Kenji Nakagaqa , Isao Masuda
- 申请人： Kenji Nakagaqa , Isao Masuda
- 申请人地址： JPX Tokyo
- 专利权人： Hoya Corporation
- 当前专利权人： Hoya Corporation
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX56-135594 19810831
- 主分类号： C03C3/087
- IPC分类号： C03C3/087 ; C03C3/105 ; C03C4/00 ; H01L21/027 ; H01L21/316 ; C03C3/04 ; C03C3/10
摘要：
A glass composition for a photoetching mask is described, which comprises, all by mol, 55 to 70% SiO.sub.2, 7 to 11% Al.sub.2 O.sub.3, 7 to 20% CaO, 3 to 13% MgO, 3 to 13% ZnO, 0.5 to 3% K.sub.2 O or Na.sub.2 O, 0 to 11% PbO and 0 to 3% ZrO.sub.2. This glass is free from defects such as pinholes, has a relatively low coefficient of thermal expansion and contains no air bubbles, and a photoetching mask composed of the glass composition.
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