Invention Grant
- Patent Title: Electroless palladium process
- Patent Title (中): 无电镀钯工艺
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Application No.: US424150Application Date: 1982-09-27
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Publication No.: US4424241APublication Date: 1984-01-03
- Inventor: Joseph A. Abys
- Applicant: Joseph A. Abys
- Applicant Address: NJ Murray Hill
- Assignee: Bell Telephone Laboratories, Incorporated
- Current Assignee: Bell Telephone Laboratories, Incorporated
- Current Assignee Address: NJ Murray Hill
- Main IPC: C23C18/44
- IPC: C23C18/44 ; C23C3/02
Abstract:
A process is described for electrolessly plating palladium metal on a variety of surfaces including palladium surfaces. The process involves use of a special electroless plating bath which is sufficiently stable for practical commercial use and yields excellent plating results. The plating bath contains a palladium salt and organic ligand. A narrow class of reducing agents is used including formaldehyde. The bath is made acid generally by the addition of nitric acid or hydrochloric acid. The process yields plating rates of about 6 microinches per minute and plating thicknesses in excess of 1 micrometer.
Public/Granted literature
- US5054920A Internal reflectance cell having improved sample flow geometry Public/Granted day:1991-10-08
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