发明授权
- 专利标题: Cephem and cepham compounds
- 专利标题(中): Cephem和cepham化合物
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申请号: US314045申请日: 1981-10-22
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公开(公告)号: US4425340A公开(公告)日: 1984-01-10
- 发明人: Tsutomu Teraji , Kazuo Sakane , Jiro Goto
- 申请人: Tsutomu Teraji , Kazuo Sakane , Jiro Goto
- 申请人地址: JPX Osaka
- 专利权人: Fujisawa Pharmaceutical Co., Ltd.
- 当前专利权人: Fujisawa Pharmaceutical Co., Ltd.
- 当前专利权人地址: JPX Osaka
- 优先权: GBX50334/78 19781229; GBX7935538 19791012; ZAX80/6068 19801001
- 主分类号: C07C17/26
- IPC分类号: C07C17/26 ; C07D209/48 ; C07D249/12 ; C07D257/04 ; C07D285/08 ; C07D295/21 ; C07D501/24 ; A61K31/545
摘要:
This invention relates to new cephem and cepham compounds of high antimicrobial activity of the formula: ##STR1## wherein R.sup.1 is amino or a protected amino,R.sup.2 is hydrogen, acyl, aryl which may be substituted with suitable substituent(s), lower alkyl substituted with suitable substituent(s), lower alkenyl, lower alkynyl, cycloalkyl which may be substituted with suitable substituent(s), cyclo(lower)alkenyl, or S or O containing 5-membered heterocyclic group substituted with oxo group(s),R.sup.3 is hydrogen or lower alkyl,R.sup.4 is hydrogen, acyloxy(lower)alkyl; acylthio(lower) alkyl; pyridinium(lower)alkyl which may be substituted with suitable substituent(s); a heterocyclicthio(lower)alkyl which may be substituted with suitable substituent(s); lower alkyl;l halogen; hydroxy; thiazolium(lower)alkyl which may be substituted with suitable substituent(s); or lower alkoxy; R.sup.5 is carboxy or a protected carboxy, wherein R.sup.5 is COO.sup.- when R.sup.4 is pyridinium(lower)alkyl which may be substituted with suitable substituent(s) or thiazolium(lower)alkyl which may be substituted with suitable substituent(s), and the heavy solid line means single or double bond; and pharmaceutically acceptable salt thereof.
公开/授权文献
- US5707851A Gram-positive alkaliphilic microorganisms 公开/授权日:1998-01-13
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