发明授权
US4430445A Novel basic imidazolylmethylstyrene compound, its polymer, a process for
the preparation thereof and a use as ion exchange resin
失效
新的基本咪唑基甲基苯乙烯化合物，其聚合物，其制备方法和用作离子交换树脂
- 专利标题： Novel basic imidazolylmethylstyrene compound, its polymer, a process for the preparation thereof and a use as ion exchange resin
- 专利标题（中）： 新的基本咪唑基甲基苯乙烯化合物，其聚合物，其制备方法和用作离子交换树脂
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申请号： US335943申请日： 1981-12-30
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公开(公告)号： US4430445A公开(公告)日： 1984-02-07
- 发明人: Tetsuya Miyake , Kunihiko Takeda , Keishi Tada
- 申请人： Tetsuya Miyake , Kunihiko Takeda , Keishi Tada
- 申请人地址： JPX Osaka
- 专利权人： Asahi Kasei Kogyo Kabushiki Kaisha
- 当前专利权人： Asahi Kasei Kogyo Kabushiki Kaisha
- 当前专利权人地址： JPX Osaka
- 优先权： JPX54-90901 19790719; JPX56-3739 19810116; JPX56-4954 19810119; JPX56-4955 19810119
- 主分类号： C07D233/54
- IPC分类号： C07D233/54 ; C07D233/92 ; C07D521/00 ; C08F12/32 ; B01J39/20 ; C08F26/06
摘要：
Novel imidazolylmethylstyrene compounds which are basic compounds and have excellent resistance to oxidation and high polymerizability are disclosed. The basic compound of the present invention is prepared by reacting a halogenomethyl-styrene with an imidazole compound, and can be used, for example, as a curing agent for epoxy resins. The imidazolymethylstyrene compounds are readily homopolymerized or copolymerized to provide linear homopolymers, linear copolymers or cross-linked copolymers having pendant imidazolylmethylphenyl groups. These polymers have greater resistance to oxidation than the homologues, and are useful as an ion exchange resin, extractant of metals, sizing agent and antistatic agent.
公开/授权文献
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