发明授权
- 专利标题: Method of electron beam exposure
- 专利标题(中): 电子束曝光方法
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申请号: US387678申请日: 1982-06-11
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公开(公告)号: US4443704A公开(公告)日: 1984-04-17
- 发明人: Yoshimi Yamashita , Sumio Yamamoto
- 申请人: Yoshimi Yamashita , Sumio Yamamoto
- 申请人地址: JPX Kawasaki
- 专利权人: Fujitsu Limited
- 当前专利权人: Fujitsu Limited
- 当前专利权人地址: JPX Kawasaki
- 优先权: JPX54-95839 19790727
- 主分类号: H01L21/027
- IPC分类号: H01L21/027 ; G03F7/207 ; H01J37/304 ; H01L21/30 ; H01L23/544 ; G01N21/00 ; G01N23/00
摘要:
A method of electron beam exposure in which a plurality of sets of reference values for setting the conditions for electron beam exposure are found in relation to a plurality of sizing marks which are successively arrayed at positions in the vicinity of the pattern area of a specimen, and the exposure condition values corresponding to registration marks on the surface of the specimen are derived from these said reference values for setting the exposure conditions.
公开/授权文献
- US5586755A Misfeed detector for a stack of different weight sheets 公开/授权日:1996-12-24