A silver halide photographic light-sensitive material comprising a support having thereon at least one silver halide emulsion layer wherein the photographic light-sensitive material contains a compound represented by the following general formula (I): ##STR1## wherein Rf represents a saturated or unsaturated hydrocarbon group having from 3 to 20 carbon atoms wherein all or a part of the hydrogen atoms are substituted with fluorine atoms; A and B each represents a divalent linking group; R.sub.1 represents a hydrogen atom or an alkyl group; R.sub.2, R.sub.3 and R.sub.4 each represents an alkyl group and at least one of R.sub.1, R.sub.2, R.sub.3 and R.sub.4 represents an alkyl group substituted with a monovalent group, and X represents an anion.The photographic light-sensitive material containing the compound represented by the general formula (I) provides improved antistatic properties without adversely affecting the photographic properties and can be prepared without problems during coating such as formation of "comets" and "repelling".